DocumentCode
2146536
Title
Modeling and analysis of effect on bit-line voltage caused by imprint in FeRAM
Author
Zhou, Sheng-ze ; Jia, Ze ; Ren, Tian-Ling
Author_Institution
Tsinghua Nat. Lab. for Inf. Sci. & Technol., Tsinghua Univ., Beijing
fYear
2008
fDate
20-23 Oct. 2008
Firstpage
884
Lastpage
887
Abstract
This study analyzed the effect on the bit-line voltage of imprint degradation in FeRAM. The hysteresis loop of the ferroelectric capacitor fitted by the three-line piecewise linear approximation model is proposed here to establish the relationship between bit-line voltage and imprint. Formulas are derived from this model for approximately calculation of the variation of bit-line voltage along with imprint voltage. The results show a linear dependence of the bit-line voltage on the imprint, and the scope of this linear relationship are determined by the parameters extracted from the hysteresis loop. The results also show that the ferroelectric capacitor with a more rectangular hysteresis loop shows less variation of the bit-line voltage according to imprint.
Keywords
dielectric hysteresis; ferroelectric capacitors; ferroelectric storage; piecewise linear techniques; random-access storage; FeRAM; bit-line voltage; ferroelectric capacitor; ferroelectric random access memory; imprint degradation; rectangular hysteresis loop; three-line piecewise linear approximation model; Capacitors; Cause effect analysis; Degradation; Ferroelectric films; Ferroelectric materials; Hysteresis; Nonvolatile memory; Piecewise linear approximation; Random access memory; Voltage; FeRAM; imprint; modeling; three-line piecewise;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State and Integrated-Circuit Technology, 2008. ICSICT 2008. 9th International Conference on
Conference_Location
Beijing
Print_ISBN
978-1-4244-2185-5
Electronic_ISBN
978-1-4244-2186-2
Type
conf
DOI
10.1109/ICSICT.2008.4734675
Filename
4734675
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