• DocumentCode
    2149276
  • Title

    Electrical characterization of ultrathin single crystalline Gd2O3/Si(100) with Pt top electrode

  • Author

    Sun, Qing-Qing ; Laha, Apurba ; Osten, H. Jörg ; Ding, Shi-Jin ; Zhang, David Wei ; Fissel, A.

  • Author_Institution
    Dept. of Microelectron., Fudan Univ., Shanghai, China
  • fYear
    2008
  • fDate
    20-23 Oct. 2008
  • Firstpage
    1276
  • Lastpage
    1279
  • Abstract
    Capacitor composed of single crystalline Gd2O3 on Si(100) with Pt top electrode was fabricated by molecular beam epitaxy. We present a systematic study of electrical properties of as-grown single crystalline Pt/Gd2O3/Si(100). Three capacitors with different thickness are used for electrical evaluation. The EOT of the samples are estimated to be 0.7 nm, 1.2 nm and 1.8 nm respectively. Work function of Pt on Gd2O3 is pinned at 4.75 eV and due to the lattice mismatch between Gd2O3, the interface state density is in the level of 1013 extracted by Terman and conductance methods.
  • Keywords
    capacitors; electrodes; elemental semiconductors; gadolinium compounds; molecular beams; platinum; silicon; Gd2O3; Terman extraction; conductance method; electrical characterization; lattice mismatch; molecular beam epitaxy; top electrode; ultrathin single crystalline capacitor; Amorphous materials; Capacitance-voltage characteristics; Crystallization; Dielectric constant; Electrodes; High K dielectric materials; High-K gate dielectrics; Laboratories; Molecular beam epitaxial growth; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State and Integrated-Circuit Technology, 2008. ICSICT 2008. 9th International Conference on
  • Conference_Location
    Beijing
  • Print_ISBN
    978-1-4244-2185-5
  • Electronic_ISBN
    978-1-4244-2186-2
  • Type

    conf

  • DOI
    10.1109/ICSICT.2008.4734784
  • Filename
    4734784