DocumentCode
2149276
Title
Electrical characterization of ultrathin single crystalline Gd2 O3 /Si(100) with Pt top electrode
Author
Sun, Qing-Qing ; Laha, Apurba ; Osten, H. Jörg ; Ding, Shi-Jin ; Zhang, David Wei ; Fissel, A.
Author_Institution
Dept. of Microelectron., Fudan Univ., Shanghai, China
fYear
2008
fDate
20-23 Oct. 2008
Firstpage
1276
Lastpage
1279
Abstract
Capacitor composed of single crystalline Gd2O3 on Si(100) with Pt top electrode was fabricated by molecular beam epitaxy. We present a systematic study of electrical properties of as-grown single crystalline Pt/Gd2O3/Si(100). Three capacitors with different thickness are used for electrical evaluation. The EOT of the samples are estimated to be 0.7 nm, 1.2 nm and 1.8 nm respectively. Work function of Pt on Gd2O3 is pinned at 4.75 eV and due to the lattice mismatch between Gd2O3, the interface state density is in the level of 1013 extracted by Terman and conductance methods.
Keywords
capacitors; electrodes; elemental semiconductors; gadolinium compounds; molecular beams; platinum; silicon; Gd2O3; Terman extraction; conductance method; electrical characterization; lattice mismatch; molecular beam epitaxy; top electrode; ultrathin single crystalline capacitor; Amorphous materials; Capacitance-voltage characteristics; Crystallization; Dielectric constant; Electrodes; High K dielectric materials; High-K gate dielectrics; Laboratories; Molecular beam epitaxial growth; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State and Integrated-Circuit Technology, 2008. ICSICT 2008. 9th International Conference on
Conference_Location
Beijing
Print_ISBN
978-1-4244-2185-5
Electronic_ISBN
978-1-4244-2186-2
Type
conf
DOI
10.1109/ICSICT.2008.4734784
Filename
4734784
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