• DocumentCode
    2150624
  • Title

    The RF front-end single-chip SOI solution

  • Author

    Ma, Pingxi ; Racanelli, Marco

  • Author_Institution
    Jazz Semicond., Newport Beach, CA, USA
  • fYear
    2008
  • fDate
    20-23 Oct. 2008
  • Firstpage
    1456
  • Lastpage
    1459
  • Abstract
    In order to verify RF front-end single-chip solution, we have demonstrated several design cases for both Power Amplifier (PA) cells using SiGe HBTs and RF Switches (RFS) using CMOS technology on SOI. The PA-cell packaged has achieved 28 dBm linear output power with 36.2% PAE and more than 9.1dB gain at 836 MHz and 3.6 V. The PA-cell passes VSWR=10:1 ruggedness test at 4.2 V. With more on-wafer loadpulled results, we can qualify the PA-cell for CDMA/WCDMA applications. The RFS has on-wafer measured 0.5~1.5 dB insertion loss until 2.4 GHz and the packaged SP6T test [4] has reached >=34 dBc isolation and 1.4 dB insertion loss at 1.8 GHz with 41 dBm P0.1dB at 900 MHz. The design test has shown a promising perspective that the RF front-end single-chip solution will be capable of implementations based on Jazz¿s thick-film SOI SiGe BiCMOS technology platform.
  • Keywords
    BiCMOS integrated circuits; Ge-Si alloys; UHF integrated circuits; UHF power amplifiers; code division multiple access; heterojunction bipolar transistors; semiconductor materials; semiconductor switches; silicon-on-insulator; thick film circuits; CDMA; HBTs; RF switches; SOI; SiGe; frequency 1.8 GHz; frequency 836 MHz; frequency 900 MHz; front-end single-chip; gain 9.1 dB; insertion loss; isolation loss; loss 0.5 dB to 1.5 dB; power amplifier cells; thick film BiCMOS technology; voltage 3.6 V; voltage 4.2 V; CMOS technology; Germanium silicon alloys; Insertion loss; Multiaccess communication; Packaging; Power amplifiers; Radio frequency; Radiofrequency amplifiers; Silicon germanium; Testing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State and Integrated-Circuit Technology, 2008. ICSICT 2008. 9th International Conference on
  • Conference_Location
    Beijing
  • Print_ISBN
    978-1-4244-2185-5
  • Electronic_ISBN
    978-1-4244-2186-2
  • Type

    conf

  • DOI
    10.1109/ICSICT.2008.4734840
  • Filename
    4734840