• DocumentCode
    2153864
  • Title

    An asymmetrical lightly-doped source (ALDS) cell for virtual ground high density EPROMs

  • Author

    Yoshikawa, K. ; Mori, S. ; Narita, K. ; Arai, N. ; Ohshima, Y. ; Kaneko, Y. ; Araki, H.

  • Author_Institution
    Toshiba Corp., Kawasaki, Japan
  • fYear
    1988
  • fDate
    11-14 Dec. 1988
  • Firstpage
    432
  • Lastpage
    435
  • Abstract
    A novel EPROM (erasable programmable read-only memory) cell structure with asymmetrically doped source and drain junction suitable for virtual ground array architecture is described. The asymmetric cell nature eliminates a write disturbance of the adjacent cell in the write mode. In the read mode, the cell provides higher read current and substantial soft-write lifetime as a result of the selection of the lightly doped n/sup -/ region as the drain. The cell is implemented in virtual ground designs. A novel planarized process has been developed to improve the manufacturability. It is concluded that such scalable cell and array structures are promising for the next-generation high-density EPROMs in the 16-Mb regime.<>
  • Keywords
    PROM; VLSI; field effect integrated circuits; integrated circuit technology; integrated memory circuits; 16 Mbit; 16-Mb regime; ULSI; asymmetric cell nature; asymmetrical lightly-doped source; asymmetrically doped source and drain; cell structure; erasable programmable read-only memory; high density EPROMs; manufacturability; next-generation; planarized process; scalable cell; soft-write lifetime; virtual ground array architecture; virtual ground designs; Capacitance; Degradation; EPROM; Etching; Implants; Insulation; Isolation technology; Oxidation; Planarization; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1988. IEDM '88. Technical Digest., International
  • Conference_Location
    San Francisco, CA, USA
  • ISSN
    0163-1918
  • Type

    conf

  • DOI
    10.1109/IEDM.1988.32848
  • Filename
    32848