DocumentCode
2155473
Title
Short channel effects in submicron self-aligned gate heterostructure field effect transistors
Author
Han, C.J. ; Ruden, P.P. ; Grider, D. ; Fraasch, A. ; Newstrom, K. ; Joslyn, P. ; Shur, M.
Author_Institution
Honeywell Sensors & Signal Process. Lab., Bloomington, MN, USA
fYear
1988
fDate
11-14 Dec. 1988
Firstpage
696
Lastpage
699
Abstract
AlGaAs/GaAs self-aligned gate heterostructure FETs with gate lengths varying from 0.3 to 1.5 mu m were fabricated to study short-channel effects. Peak extrinsic transconductance as high as 360 mS/mm was achieved with this process. Short-channel effects such as increases in the output conductance, increases in the subthreshold current, and shifts in the threshold voltage are reported for temperatures ranging from 30 degrees C to 100 degrees C. The observations follow closely predictions from a simple model which attributes the effects to space-charge-limited electron injection into the GaAs buffer layer beneath the actual two-dimensional electron gas channel.<>
Keywords
III-V semiconductors; aluminium compounds; gallium arsenide; high electron mobility transistors; semiconductor device models; 0.3 to 1.5 micron; 30 to 100 C; 360 mS/mm; AlGaAs-GaAs; GaAs buffer layer; HEMTs; MODFETs; extrinsic transconductance; gate lengths; heterostructure FETs; model; output conductance; self-aligned gate heterostructure field effect transistors; semiconductors; short-channel effects; space-charge-limited electron injection; submicron; subthreshold current; temperatures; two-dimensional electron gas channel; Buffer layers; Electrons; Gallium arsenide; HEMTs; MODFETs; Predictive models; Subthreshold current; Temperature distribution; Threshold voltage; Transconductance;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1988. IEDM '88. Technical Digest., International
Conference_Location
San Francisco, CA, USA
ISSN
0163-1918
Type
conf
DOI
10.1109/IEDM.1988.32908
Filename
32908
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