• DocumentCode
    2161258
  • Title

    3D EM Characterization of Wafer Probes

  • Author

    Ding, Hanyi ; Wolf, Randy ; Ferrario, John

  • Author_Institution
    IBM Microelectronics, 1000 River St., Essex Junction, VT 05452, USA. hanyi@us.ibm.com
  • fYear
    2001
  • fDate
    24-26 Sept. 2001
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    The following paper describes a method to characterize wafer probes using a 3D EM simulator. Rather than following the traditional method of building a custom test fixture for different probe setups and measuring the S-parameters, this 3D EM characterization method yields multi-port S-parameters of a specific probe structure by utilizing simulations. For a standard characterization, the S-parameters can be a four-port S-parameter matrix for two selected probe pins. This matrix can be used directly by many RF design tools for design and analysis, and can be used to extract the equivalent circuit models of probes (if needed). An agreement has been obtained between data from the 3D EM characterization and the traditional method. In contrast to traditional methods, the 3D EM characterization method provides a fast and flexible technique to obtain an RF model of probes.
  • Keywords
    Buildings; Circuit simulation; Data mining; Equivalent circuits; Fixtures; Pins; Probes; Radio frequency; Scattering parameters; Testing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microwave Conference, 2001. 31st European
  • Conference_Location
    London, England
  • Type

    conf

  • DOI
    10.1109/EUMA.2001.338945
  • Filename
    4140013