DocumentCode
2161258
Title
3D EM Characterization of Wafer Probes
Author
Ding, Hanyi ; Wolf, Randy ; Ferrario, John
Author_Institution
IBM Microelectronics, 1000 River St., Essex Junction, VT 05452, USA. hanyi@us.ibm.com
fYear
2001
fDate
24-26 Sept. 2001
Firstpage
1
Lastpage
4
Abstract
The following paper describes a method to characterize wafer probes using a 3D EM simulator. Rather than following the traditional method of building a custom test fixture for different probe setups and measuring the S-parameters, this 3D EM characterization method yields multi-port S-parameters of a specific probe structure by utilizing simulations. For a standard characterization, the S-parameters can be a four-port S-parameter matrix for two selected probe pins. This matrix can be used directly by many RF design tools for design and analysis, and can be used to extract the equivalent circuit models of probes (if needed). An agreement has been obtained between data from the 3D EM characterization and the traditional method. In contrast to traditional methods, the 3D EM characterization method provides a fast and flexible technique to obtain an RF model of probes.
Keywords
Buildings; Circuit simulation; Data mining; Equivalent circuits; Fixtures; Pins; Probes; Radio frequency; Scattering parameters; Testing;
fLanguage
English
Publisher
ieee
Conference_Titel
Microwave Conference, 2001. 31st European
Conference_Location
London, England
Type
conf
DOI
10.1109/EUMA.2001.338945
Filename
4140013
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