DocumentCode
2166393
Title
Effect of lithography stitching errors on Silicon-on-Insulator photonic wires
Author
Gnan, M. ; Sorel, M. ; Macintyre, Douglas S. ; Pottier, P. ; Thorns, S. ; De La Rue, R.M.
Author_Institution
Glasgow Univ., Glasgow
fYear
2007
fDate
17-22 June 2007
Firstpage
1
Lastpage
1
Abstract
Electron beam lithography (EBL) is a widely used tool in the patterning of photonic integrated circuits, either by direct writing or by UV lithography with e-beam defined masks. It provides the benefit of pattern flexibility, high accuracy and the required nanometre-scale resolution.
Keywords
electron beam lithography; integrated optics; electron beam lithography; lithography stitching errors; photonic integrated circuits; silicon-on-insulator photonic wires; Attenuation; Circuits; Error correction; Gratings; Lithography; Optical losses; Propagation losses; Silicon on insulator technology; Wires; Writing;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 2007 and the International Quantum Electronics Conference. CLEOE-IQEC 2007. European Conference on
Conference_Location
Munich
Print_ISBN
978-1-4244-0930-3
Type
conf
DOI
10.1109/CLEOE-IQEC.2007.4386611
Filename
4386611
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