• DocumentCode
    2169628
  • Title

    The future of flash memory: Is floating gate technology doomed to lose the race?

  • Author

    Wellekens, Dirk ; Van Houdt, Jan

  • fYear
    2008
  • fDate
    2-4 June 2008
  • Firstpage
    189
  • Lastpage
    194
  • Abstract
    Since the very beginning of the flash memory era, the market has been dominated by the floating gate technology. However, as floating gate flash continues along a very steep scaling path, more and more barriers start to appear, limiting further scaling possibilities of the technology. At the same time, other concepts are preparing to take over. This paper concentrates on the prospect of high-k materials to extend floating gate scaling and explores the possibilities and promises these materials offer to further extend the floating gate concept as the dominant flash technology.
  • Keywords
    dielectric materials; flash memories; random-access storage; flash memory; floating gate scaling; floating gate technology; high-k materials; nonvolatile memory; Aluminum oxide; Character generation; Dielectric losses; Flash memory; High K dielectric materials; High-K gate dielectrics; Nonvolatile memory; Semiconductor materials; Silicon on insulator technology; Voltage; Flash memory; floating gate; high-k materials; nonvolatile memory;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Integrated Circuit Design and Technology and Tutorial, 2008. ICICDT 2008. IEEE International Conference on
  • Conference_Location
    Austin, TX
  • Print_ISBN
    978-1-4244-1810-7
  • Electronic_ISBN
    978-1-4244-1811-4
  • Type

    conf

  • DOI
    10.1109/ICICDT.2008.4567276
  • Filename
    4567276