• DocumentCode
    2169781
  • Title

    High Work-Function Oxygen-Bearing Electrodes for Improved Performance in MANOS Charge-Trap NVM and MIM-DRAM Type Devices

  • Author

    Gilmer, D.C. ; Goel, N. ; Park, H. ; Park, C. ; Barnett, J. ; Kirsch, P.D. ; Jammy, R.

  • Author_Institution
    SEMATECH, Austin, TX
  • fYear
    2009
  • fDate
    10-14 May 2009
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    We demonstrate for the first time molybdenum based oxygen-bearing electrodes for improved performance in MANOS (Metal-Alumina-Nitride-Oxide) charge-trap NVM, and also MIM-DRAM type devices. The meta-stable high work- function (Wfn) molybdenum-oxynitride (MoON) electrodes result in improved retention and erase saturation for the charge trap NVM devices and improved leakage for the MIM devices. Although some of the observed improvements, compared to conventional TaN or TIN electrodes, can be attributed to the higher effective Wfn of the MoON, the improvements are also attributed to free oxygen available during deposition, and also released from the MoON electrode during thermal processing, repairing defects in the respective dielectrics adjacent to the MoON electrodes.
  • Keywords
    DRAM chips; MIM devices; MOSFET; alumina; dielectric thin films; flash memories; molybdenum compounds; MANOS flash MOSFETs; MIM-DRAM type devices; MoON; defects; dielectrics; erase saturation; metal-alumina-nitride-oxide charge-trap NVM type devices; molybdenum-oxynitride electrodes; oxygen-bearing electrodes; thermal processing; work function; Aluminum oxide; Annealing; Dielectric devices; Electrodes; Electrons; Energy barrier; Hafnium oxide; MIM devices; Moon; Tin;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Memory Workshop, 2009. IMW '09. IEEE International
  • Conference_Location
    Monterey, CA
  • Print_ISBN
    978-1-4244-3762-7
  • Type

    conf

  • DOI
    10.1109/IMW.2009.5090594
  • Filename
    5090594