• DocumentCode
    2169847
  • Title

    15 nm gate length planar CMOS transistor

  • Author

    Bin Yu ; Haihong Wang ; Joshi, A. ; Qi Xiang ; Effiong Ibok ; Ming-Ren Lin

  • Author_Institution
    Strategic Technol. Group, Adv. Micro Devices, Sunnyvale, CA, USA
  • fYear
    2001
  • fDate
    2-5 Dec. 2001
  • Abstract
    Continued scaling of mainstream planar CMOS transistor technology into the deep-sub-100 nm regime is increasingly challenging but possible. In this paper, we report bulk-silicon planar CMOS transistors with the physical gate length scaled down to 15 nm. Gate delays (CV/I) of 0.29 ps for n-channel FET and 0.68 ps for p-channel FET are achieved at a supply voltage of 0.8 V. Energy-delay products are 42 pJ-ps/m for an n-channel FET and 97 pJ-ps/m for a p-channel FET, respectively. To our knowledge; these numbers are the best reported to date.
  • Keywords
    CMOS integrated circuits; MOSFET; VLSI; elemental semiconductors; nanotechnology; silicon; 0.29 ps; 0.68 ps; 0.8 V; 15 nm; Si; bulk-Si CMOSFETs; channel profile design; gate delays; gate dielectrics scaling; high-k gate dielectric; n-channel FET; p-channel FET; physical gate length scaling; planar CMOS transistor technology; ultra-shallow junction; CMOS technology; Delay; Dielectrics; FETs; Fabrication; Lithography; Oxidation; Scalability; Transistors; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 2001. IEDM '01. Technical Digest. International
  • Conference_Location
    Washington, DC, USA
  • Print_ISBN
    0-7803-7050-3
  • Type

    conf

  • DOI
    10.1109/IEDM.2001.979669
  • Filename
    979669