• DocumentCode
    2170895
  • Title

    Thermal conductivity of SOI device layers

  • Author

    Asheghi, Mehdi ; Ju, Y. Sungtaek ; Goodson, Kenneth E.

  • Author_Institution
    Dept. of Mech. Eng., Stanford Univ., CA, USA
  • fYear
    1997
  • fDate
    6-9 Oct 1997
  • Firstpage
    134
  • Lastpage
    135
  • Abstract
    Summary form only given. Self heating affects the performance and reliability of SOI circuits, particularly during ESD or in circuits requiring impedance matching. The temperature field in SOI devices is strongly influenced by heat conduction along the Si device layer, whose thermal conductivity is dominated by phonon transport and is reduced by scattering mechanisms. Although SOI device simulations need accurate values of the device-layer thermal conductivity, the impact of phonon-boundary scattering is not known. We use data and predictions to show that boundary scattering is very important for thin-film SOI and provides a model for device simulations
  • Keywords
    electrostatic discharge; phonon-impurity interactions; phonon-phonon interactions; semiconductor device models; semiconductor device reliability; silicon-on-insulator; thermal analysis; thermal conductivity; ESD; SOI device layers; SOI device simulations; Si; heat conduction; impedance matching; model; phonon transport; phonon-boundary scattering; scattering mechanisms; self heating; temperature field; thermal conductivity; thin-film SOI; Circuit simulation; Electrostatic discharge; Heating; Impedance matching; Phonons; Predictive models; Scattering; Temperature; Thermal conductivity; Thin film devices;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    SOI Conference, 1997. Proceedings., 1997 IEEE International
  • Conference_Location
    Fish Camp, CA
  • ISSN
    1078-621X
  • Print_ISBN
    0-7803-3938-X
  • Type

    conf

  • DOI
    10.1109/SOI.1997.634969
  • Filename
    634969