DocumentCode
2171800
Title
Pulsed plasma treatment of polluted gas using wet/low temperature corona reactors
Author
Shimizu, K. ; Kinoshita, K. ; Yanagihara, K. ; Rajanikanth, B.S. ; Katsura, S. ; Mizuno, A.
Author_Institution
Dept. of Ecological Eng., Toyohashi Univ. of Technol., Japan
Volume
2
fYear
1995
fDate
8-12 Oct 1995
Firstpage
1432
Abstract
Application of pulsed plasma for gas cleaning is gaining prominence in recent years mainly from the energy consideration point of view. Normally, gas treatment is carried out, at or above room temperature, by a conventional dry type corona reactor. However, this treatment is still inadequate in the removal of certain stable gases present in the exhaust/flue gas mixture. The authors report some interesting results of the treatment of such stable gases with pulsed plasma at very low ambient temperature. Also reported in the paper is an improvement in DeNO/DeNOx efficiency using unconventional wet-type reactors, designed and fabricated by the authors, operating at different ambient temperatures. Apart from laboratory tests on simulated gas mixtures, field tests were also carried out on the exhaust gas of a 8 kW diesel engine. Further, an attempt was made to test the feasibility of a helical wire as a corona electrode in place of the conventional straight wire electrode. A comparative analysis of the various tests is presented together with a note on the energy consideration
Keywords
air pollution; air pollution control; corona; energy conservation; nitrogen compounds; plasma applications; plasma devices; pollution control; 8 kW; DeNO; DeNOx; NO; air pollution removal; ambient temperature; corona electrode; energy savings; field tests; gas cleaning; helical wire; low temperature corona reactors; pulsed plasma treatment; wet corona reactors; Corona; Electrodes; Gases; Inductors; Plasma applications; Plasma stability; Plasma temperature; Pollution; Testing; Wire;
fLanguage
English
Publisher
ieee
Conference_Titel
Industry Applications Conference, 1995. Thirtieth IAS Annual Meeting, IAS '95., Conference Record of the 1995 IEEE
Conference_Location
Orlando, FL
ISSN
0197-2618
Print_ISBN
0-7803-3008-0
Type
conf
DOI
10.1109/IAS.1995.530470
Filename
530470
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