DocumentCode
2174634
Title
Design and performance of InP/GaInAs/InP abrupt DHBTs
Author
Elias, D. Cohen ; Kraus, S. ; Gavrilov, A. ; Cohen, S. ; Buadana, N. ; Sidorov, V. ; Ritter, D.
Author_Institution
Dept. of Electr. Eng., Technion-Israel Inst. of Technol., Haifa
fYear
2005
fDate
8-12 May 2005
Firstpage
449
Lastpage
451
Abstract
We discuss the field collapse threshold in abrupt DHBTs in which the barrier between the base and the collector is eliminated by delta doping. A DHBT with 150 nm thick collector operating at a current density of 4 mA/mum2 is presented. We show theoretically that the carrier density at the onset of the filed collapse effect can be doubled by inserting an additional delta doped layer at the center of the collector
Keywords
III-V semiconductors; carrier density; current density; gallium arsenide; gallium compounds; heterojunction bipolar transistors; indium compounds; semiconductor device models; semiconductor doping; DHBT; InP-GaInAs-InP; carrier density; collapse effect; current density; delta doping; Aluminum; Charge carrier density; Critical current density; Current density; Doping; Double heterojunction bipolar transistors; Frequency; Indium phosphide; Voltage; Wet etching;
fLanguage
English
Publisher
ieee
Conference_Titel
Indium Phosphide and Related Materials, 2005. International Conference on
Conference_Location
Glasgow, Scotland
ISSN
1092-8669
Print_ISBN
0-7803-8891-7
Type
conf
DOI
10.1109/ICIPRM.2005.1517528
Filename
1517528
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