Integration of low-k spin-on polymer and Cu for Damascene

Author

Chang, W. ; Chiou, W.C. ; Li, L.J. ; Chao, L.C. ; Jang, S.M. ; Yu, C.H. ; Liang, M.S.

Author_Institution

Taiwan Semiconductor Manufacturing Company

fYear

2000

fDate

2000

Keywords

CMOS technology; Capacitance; Coatings; Etching; Polymers; Resists; Solvents; Surface treatment; Testing; Thermal resistance;

fLanguage

English

Publisher

ieee

Conference_Titel

Interconnect Technology Conference, 2000. Proceedings of the IEEE 2000 International

Print_ISBN

0-7803-6327-2

Type

DOI

10.1109/IITC.2000.854288

Filename

854288

Link To Document