Multi-spot model showing the effects of nano-spot sizes

Author

Malucci, Robert D.

Author_Institution

RD Malucci Consulting, Naperville, IL, USA

fYear

2005

fDate

26-28 Sept. 2005

Firstpage

291

Lastpage

297

Abstract

A multi-spot stochastic model is developed to calculate the resistance of degraded contacts. Variables such as number and size of contact spots, and thickness and resistivity of oxide films are varied randomly to simulate the impact on contact resistance. In addition, the effects of small contact spots are estimated using the Sharvin and Wexler equations for cases where the Knudsen ratio is small (where the size of a contact spot approaches or falls below the collision mean free path of electrons). The results are used to show the statistical variations in contact resistance due to random variations in film characteristics. Test data are provided as a comparison to the model predictions and are used to validate the model results.

Keywords

contact resistance; films; nanostructured materials; stochastic processes; Knudsen ratio; Sharvin-Wexler equations; collision mean free path; contact resistance; contact spots; multi-spot stochastic model; nano-spot sizes; oxide films; statistical variations; Contact resistance; Corrosion; Degradation; Electrons; Equations; Predictive models; Rough surfaces; Stochastic processes; Surface resistance; Surface roughness;

fLanguage

English

Publisher

ieee

Conference_Titel

Electrical Contacts, 2005. Proceedings of the Fifty-First IEEE Holm Conference on

Print_ISBN

0-7803-9113-6

Type

conf

DOI

10.1109/HOLM.2005.1518259

Filename

1518259