DocumentCode
2204456
Title
Theoretical overview of the large area plasma processing system (LAPPS)
Author
Manheimer, W.M. ; Fernsler, R. ; Lampe, M. ; Meger, R.
Author_Institution
Naval Res. Lab., Washington, DC, USA
fYear
2000
fDate
4-7 June 2000
Firstpage
151
Abstract
Summary form only given. An initial theoretical study of LAPPS has focused on plasma and free radical production, ion fluxes to substrates, uniformity of the plasma and flux for insulating and conducting substrates, as well as DC and RF sheaths. This theoretical work has been used to analyze several initial experiments on isotropic etching, ion fluxes to conducting substrates, and measurements of electron temperature.
Keywords
plasma diagnostics; plasma materials processing; plasma production; plasma sheaths; plasma temperature; substrates; DC sheaths; RF sheaths; conducting substrates; electron temperature; free radical production; insulating substrates; ion fluxes; isotropic etching; large area plasma processing system; plasma production; uniformity; Etching; Insulation; Plasma applications; Plasma materials processing; Plasma measurements; Plasma sheaths; Plasma temperature; Production; Radio frequency; Temperature measurement;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 2000. ICOPS 2000. IEEE Conference Record - Abstracts. The 27th IEEE International Conference on
Conference_Location
New Orleans, LA, USA
ISSN
0730-9244
Print_ISBN
0-7803-5982-8
Type
conf
DOI
10.1109/PLASMA.2000.854829
Filename
854829
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