• DocumentCode
    2204537
  • Title

    The effect of static magnetic field configuration on the ion production efficiency and operational stability of a microwave plasma source

  • Author

    Perrin, M. ; Grotjohn, Timothy A. ; Asmussen, J.

  • Author_Institution
    Michigan State Univ., East Lansing, MI, USA
  • fYear
    2000
  • fDate
    4-7 June 2000
  • Firstpage
    152
  • Abstract
    Summary form only given. In the last five years interest has grown in non-magnetized, large area, low pressure microwave plasma sources. The advantages of eliminating costly, bulky, high power consuming electromagnets or permanent magnets from a plasma system are clear. We should then ask: Is a static B-field ever necessary? Under what conditions do static B-fields increase or decrease plasma source performance? To answer these questions a microwave plasma source is evaluated with three different static B-field configurations: 1) a standard multipolar permanent magnet array with 8 alternating pole faces around the discharge chamber, 2) an axially directed divergent B-field produced by a large permanent magnet near the top of the discharge chamber, and 3) no magnets.
  • Keywords
    magnetic field effects; plasma instability; plasma production; alternating pole faces; axially directed divergent B-field; discharge chamber; electromagnets; ion production efficiency; microwave plasma source; multipolar permanent magnet array; nonmagnetized large area low pressure microwave plasma sources; operational stability; permanent magnet; permanent magnets; plasma source performance; plasma system; static B-field; static magnetic field configuration; Electrons; Fault location; Magnetic field measurement; Permanent magnets; Plasma measurements; Plasma sources; Plasma stability; Plasma temperature; Probes; Production;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 2000. ICOPS 2000. IEEE Conference Record - Abstracts. The 27th IEEE International Conference on
  • Conference_Location
    New Orleans, LA, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-5982-8
  • Type

    conf

  • DOI
    10.1109/PLASMA.2000.854832
  • Filename
    854832