Performance of the vacuum spark (VSX) and the spherical pinch (SPX) X-ray/EUV point sources

Author

Ahtik, I. ; Guo, Xuemei ; Klibanov, L. ; Semyonov, O. ; Tang, Wei ; Wirpszo, K.W. ; Wu, Feng ; Xu, Mengdi ; Panarella, E.

Author_Institution

Adv. Laser & Fusion Technol. Inc., Hull, Que., Canada

fYear

2000

fDate

4-7 June 2000

Firstpage

195

Abstract

Summary form only given. The technology of X-ray/EUV point plasma sources is competing with the multiple beam synchrotrons as radiation source for submicron lithography. However, the entrance capital cost using a synchrotron (hardware only) is near $25M, thus limiting the potential usage base to ´large´ companies. A Point Source System is being designed for an entrance price of }. Within the Point Source development, several approaches have been or are in development including the spherical pinch (SPX) and vacuum spark (VSX). ALFT was the first to use the VSX and SPX technologies for lithography applications. Research and development on the VSX/SPX technology has occurred for several years and ALFT has concluded that these technologies can be converted into devices to support the next generation of lithography tools.

Keywords

X-ray lithography; X-ray production; light sources; pinch effect; plasma production; sparks; ultraviolet lithography; Advanced Laser and Fusion Technology; capital cost; design; entrance price; hardware; large companies; lithography applications; lithography tools; multiple beam synchrotrons; plasma sources; point source development; point source system; potential usage base; radiation source; spherical pinch; spherical pinch X-ray/EUV point source; submicron lithography; synchrotron; vacuum spark X-ray/EUV point source; Costs; Frequency; Laser fusion; Lithography; Particle beams; Plasma sources; Research and development; Sparks; Synchrotrons; X-ray lasers;

fLanguage

English

Publisher

ieee

Conference_Titel

Plasma Science, 2000. ICOPS 2000. IEEE Conference Record - Abstracts. The 27th IEEE International Conference on

Conference_Location

New Orleans, LA, USA

ISSN

0730-9244

Print_ISBN

0-7803-5982-8

Type

conf

DOI

10.1109/PLASMA.2000.854994

Filename

854994