Multilayer TiCN deposition using a magnetized sheet plasma source

Summary form only given, as follows. A sheet plasma of several millimeters in thickness produced by a combination of a pair of strong dipole magnets with opposing fields and a pair of Helmholtz coils producing a magnetic mirror field was used in the deposition of titanium carbonitride (TiCN). Plasma limiters encasing a ferrite magnet and a coreless magnetic coil add to the mirror field, enhancing quiescence in the plasma. The sheet plasma of dimensions - 10.0 cm /spl times/ 20.0 cm is ideal for wide area plasma-enhanced chemical vapor deposition. A titanium disk placed near the anode was sputtered by argon plasma produced at plasma currents ranging from 2-4 A and discharge potential between 125 to 150 V. Reactive nitrogen gas was fed to the system in a N/sub 2//Ar gas pressure ratio varying from 10 - 40% N/sub 2/ in a total initial gas filling pressure of 40 mTorr. Methane gas was also introduced at between 1-10% of the total initial gas filling pressure. Stainless steel substrates (type 304 and HSS) were placed near the titanium anode and immersed in the sheet plasma core. Deposition times were from 10-30 minutes. The synthesized TiCN films were found to be excellent gauging from characterizations and confirmations done by X-ray diffraction, optical microscopy and Auger spectroscopy.