• DocumentCode
    2212547
  • Title

    Composition and instabilities of Ar/SF/sub 6/ inductive plasma discharges

  • Author

    Tuszewski, M. ; Marakhtanov, A.M. ; Chabert, Pascal ; Lichtenberg, A.J. ; Lieberman, M.A. ; White, R.R.

  • Author_Institution
    Los Alamos Nat. Lab., NM, USA
  • fYear
    2002
  • fDate
    26-30 May 2002
  • Firstpage
    290
  • Abstract
    Summary form only given. We study low-pressure (2 to 10 mTorr), planar, inductive processing discharges operated with Ar/SF/sub 6/ gas mixtures. The plasma source is powered with up to 1 kW, 13.56 MHz radio frequency. Without a Faraday shield between the 3-turn spiral coil and the quartz window, large-amplitude plasma relaxation oscillations (5 to 20 kHz) are observed in an intermediate range of RF power (0.1 to 0.3 kW). Stable capacitive discharges are seen below 0.1 kW, and stable inductive (H) discharges are sustained above 0.3 kW. These observations suggest that the relaxation oscillations might be E-H transitions, a hypothesis supported by a global instability model. We report new data from Ar/SF/sub 6/ plasma discharges concerning plasma chemistry and instability phenomena. These data may permit to modify the instability model to obtain a more quantitative agreement with the experimental observations.
  • Keywords
    argon; discharges (electric); plasma chemistry; sulphur compounds; 0.1 to 0.3 kW; 1 kW; 13.56 MHz; 2 to 10 mtorr; 3-turn spiral coil; 5 to 20 kHz; Ar-SF/sub 6/; Ar/SF/sub 6/ inductive plasma discharges; E-H transitions; composition; global instability model; instabilities; large-amplitude plasma relaxation oscillations; low-pressure planar inductive processing discharges; plasma chemistry; plasma discharges; plasma source; quartz window; Electrons; Fault location; Nuclear and plasma sciences; Plasma materials processing; Plasma measurements; Plasma sources; Plasma stability; Plasma temperature; Spirals; Sulfur hexafluoride;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 2002. ICOPS 2002. IEEE Conference Record - Abstracts. The 29th IEEE International Conference on
  • Conference_Location
    Banff, Alberta, Canada
  • Print_ISBN
    0-7803-7407-X
  • Type

    conf

  • DOI
    10.1109/PLASMA.2002.1030594
  • Filename
    1030594