DocumentCode
2212547
Title
Composition and instabilities of Ar/SF/sub 6/ inductive plasma discharges
Author
Tuszewski, M. ; Marakhtanov, A.M. ; Chabert, Pascal ; Lichtenberg, A.J. ; Lieberman, M.A. ; White, R.R.
Author_Institution
Los Alamos Nat. Lab., NM, USA
fYear
2002
fDate
26-30 May 2002
Firstpage
290
Abstract
Summary form only given. We study low-pressure (2 to 10 mTorr), planar, inductive processing discharges operated with Ar/SF/sub 6/ gas mixtures. The plasma source is powered with up to 1 kW, 13.56 MHz radio frequency. Without a Faraday shield between the 3-turn spiral coil and the quartz window, large-amplitude plasma relaxation oscillations (5 to 20 kHz) are observed in an intermediate range of RF power (0.1 to 0.3 kW). Stable capacitive discharges are seen below 0.1 kW, and stable inductive (H) discharges are sustained above 0.3 kW. These observations suggest that the relaxation oscillations might be E-H transitions, a hypothesis supported by a global instability model. We report new data from Ar/SF/sub 6/ plasma discharges concerning plasma chemistry and instability phenomena. These data may permit to modify the instability model to obtain a more quantitative agreement with the experimental observations.
Keywords
argon; discharges (electric); plasma chemistry; sulphur compounds; 0.1 to 0.3 kW; 1 kW; 13.56 MHz; 2 to 10 mtorr; 3-turn spiral coil; 5 to 20 kHz; Ar-SF/sub 6/; Ar/SF/sub 6/ inductive plasma discharges; E-H transitions; composition; global instability model; instabilities; large-amplitude plasma relaxation oscillations; low-pressure planar inductive processing discharges; plasma chemistry; plasma discharges; plasma source; quartz window; Electrons; Fault location; Nuclear and plasma sciences; Plasma materials processing; Plasma measurements; Plasma sources; Plasma stability; Plasma temperature; Spirals; Sulfur hexafluoride;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 2002. ICOPS 2002. IEEE Conference Record - Abstracts. The 29th IEEE International Conference on
Conference_Location
Banff, Alberta, Canada
Print_ISBN
0-7803-7407-X
Type
conf
DOI
10.1109/PLASMA.2002.1030594
Filename
1030594
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