• DocumentCode
    2212995
  • Title

    Electrical-thermal co-analysis for power delivery networks in 3D system integration

  • Author

    Xie, Jianyong ; Chung, Daehyun ; Swaminathan, Madhavan ; Mcallister, Michael ; Deutsch, Alina ; Jiang, Lijun ; Rubin, Barry J.

  • Author_Institution
    Sch. of Electr. & Comput. Eng., Georgia Inst. of Technol., Atlanta, GA, USA
  • fYear
    2009
  • fDate
    28-30 Sept. 2009
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    In this paper, an electrical-thermal co-analysis method for power delivery networks in 3D system integration is proposed. For electrical analysis, temperature-dependent electrical resistivity of conductors is taken into account. For thermal analysis, Joule heating effect due to the current flowing through conductors is considered. The proposed co-analysis method is carried out using Rgen and ChipJoule of IBM EIP Tool Suite. An example of 3D integration system including stacked chips, power delivery network, glass-ceramic substrate, through-silicon vias, controlled collapse chip connections (C4s), underfill material, and TIM is analyzed using the proposed method. The simulation results show that the temperature effect on IR drop can not be neglected. The error of not considering thermal effect on IR drop is about 20% in the example.
  • Keywords
    distribution networks; electrical resistivity; power engineering computing; 3D system integration; Joule heating effect; controlled collapse chip connections; electrical-thermal co-analysis; power delivery networks; temperature-dependent electrical resistivity; Computer networks; Conducting materials; Conductors; Electric resistance; Heating; Packaging; Power engineering computing; Temperature distribution; Through-silicon vias; Voltage; 3D integration; IR drop; Joule heating; electrical-thermal co-anlysis; power delivery network (PDN); temperature effect; through-silicon via (TSV);
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    3D System Integration, 2009. 3DIC 2009. IEEE International Conference on
  • Conference_Location
    San Francisco, CA
  • Print_ISBN
    978-1-4244-4511-0
  • Electronic_ISBN
    978-1-4244-4512-7
  • Type

    conf

  • DOI
    10.1109/3DIC.2009.5306525
  • Filename
    5306525