Metal nanodot array fabrication using self-assembled diblock copolymer

Author

Kim, S.J. ; Maeng, W.J. ; Park, D.H. ; Sohn, B.H. ; Kim, H.

Author_Institution

Pohang Univ. of Sci. & Technol., Pohang

Volume

1

fYear

2006

fDate

22-25 Oct. 2006

Firstpage

488

Lastpage

489

Abstract

By combining PS-PMMA self-assembled diblock copolymer (BC) and lift off process, gold nanodot array was fabricated. For surface neutralization, a novel method using conventional self assembled monolayer (SAM), MPTS (3-(p-methoxyphenyl)propyltrichlro-silane) was used. Surface treatment with SAM was analyzed by contact angle measurement and XPS. Upon the fabricated cylindrical nanohole array, gold was evaporated and 10 nm size gold nanoparticle array was fabricated by lift-off process.

Keywords

X-ray photoelectron spectra; gold; monolayers; nanoparticles; nanotechnology; polymer blends; surface treatment; (3-(p-methoxyphenyl)propyltrichlro-silane); XPS; assembled monolayer; contact angle measurement; gold nanodot array; gold nanoparticle; lift off process; metal nanodot array fabrication; nanohole array; self-assembled diblock copolymer; size 10 nm; surface neutralization; surface treatment; Chemical technology; Chemistry; Fabrication; Gold; Materials science and technology; Plasma measurements; Plasma temperature; Self-assembly; Substrates; Surface treatment; diblock copolymer; nanodot; self-assembled monolayer;

fLanguage

English

Publisher

ieee

Conference_Titel

Nanotechnology Materials and Devices Conference, 2006. NMDC 2006. IEEE

Conference_Location

Gyeongju

Print_ISBN

978-1-4244-0541-1

Electronic_ISBN

978-1-4244-0541-1

Type

conf

DOI

10.1109/NMDC.2006.4388830

Filename

4388830