Frequency, pressure, and dimensional scaling of microfabricated inductively coupled plasma sources

Author

Iza, Felipe ; Hopwood, Jeffrey

Author_Institution

Northeastern Univ., Boston, MA, USA

fYear

2002

fDate

26-30 May 2002

Firstpage

336

Abstract

Summary form only given, as follows. We are particularly interested in using miniaturized inductively coupled plasmas for the same reasons that large-scale ICPs are commonly used, namely, high plasma generation efficiency and electrodeless operation. In this work, the microfabrication of several miniature ICP configurations is described and the scaling laws that govern the shrinking of ICPs are elucidated.

Keywords

plasma materials processing; plasma pressure; plasma sheaths; plasma sources; plasma temperature; 400 mtorr; 700 MHz; dimensional scaling; effective plasma length; electrodeless operation; electron temperature; frequency; high plasma generation efficiency; microfabricated ICP sources; plasma generators miniaturization; plasma sheath thickness; power transfer efficiency; pressure; scaling laws; shrinking; transformer model; Coils; Couplings; Frequency; Large-scale systems; Plasma chemistry; Plasma density; Plasma measurements; Plasma sheaths; Plasma sources; Plasma temperature;

fLanguage

English

Publisher

ieee

Conference_Titel

Plasma Science, 2002. ICOPS 2002. IEEE Conference Record - Abstracts. The 29th IEEE International Conference on

Conference_Location

Banff, Alberta, Canada

Print_ISBN

0-7803-7407-X

Type

conf

DOI

10.1109/PLASMA.2002.1030679

Filename

1030679