• DocumentCode
    2215684
  • Title

    Sensitization of Er by Si-nanoclusters in Erbium doped Si-rich Si nitride films

  • Author

    Yang, Moon-Seung ; Shin, Jung H. ; Kim, Kyung Joong

  • Author_Institution
    Dept. of Phys., Korea Adv. Inst. of Sci. & Technol., Daejeon
  • Volume
    1
  • fYear
    2006
  • fDate
    22-25 Oct. 2006
  • Firstpage
    532
  • Lastpage
    533
  • Abstract
    Er3+ luminescent properties from Erbium doped Si-rich Si nitride (SRSN) films were investigated through photoluminescence (PL) and photoluminescence excitation spectroscopy (PLE). These films grown by ultra-high vacuum ion beam sputtering are annealed at high temperature in order to form the Si-nanoclusters (nc-Si). We find that nc-Si can act as efficient sensitizers for Er3+, displaying the strong energy transfer form nc-Si to Er ions. Er3+ luminescence lifetimes were in the 1-3 msec range at room temperature with complete suppression of temperature quenching of Er3+ intensity, indicating high luminescence efficiency as well. The PLE spectrum in film with nc-Si shows efficient Er3+ PL intensity, compared with that of pure nitride. These results imply that Er doped SRSN is a promising alternative for compact, high-efficiency Si based light sources.
  • Keywords
    erbium; photoluminescence; quenching (thermal); semiconductor thin films; silicon compounds; sputtering; SiN:Er; SiN:Er - System; luminescence lifetimes; luminescent properties; nanoclusters sensitization; photoluminescence excitation spectroscopy; semiconductor thin films; temperature 293 K to 298 K; temperature quenching; ultra-high vacuum ion beam sputtering; Annealing; Erbium; Ion beams; Luminescence; Photoluminescence; Semiconductor films; Spectroscopy; Sputtering; Temperature distribution; Temperature sensors; Erbium; Si-nanocluster (nc-Si); Si-rich Si nitride (SRSN) photoluminescence (PL);
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanotechnology Materials and Devices Conference, 2006. NMDC 2006. IEEE
  • Conference_Location
    Gyeongju
  • Print_ISBN
    978-1-4244-0540-4
  • Electronic_ISBN
    978-1-4244-0541-1
  • Type

    conf

  • DOI
    10.1109/NMDC.2006.4388888
  • Filename
    4388888