Pulsed laser deposited LiNi0.5Mn0.5O2 thin films on the Pt(200)/TiO2/SiO2/Si substrates for lithium-ion battery application

Author

Chung, Junki ; Kim, Wonjung ; Tak, Jinsung ; Lee, Sunggap ; Kim, Cheoljin

Author_Institution

Changwon Nat. Univ., Changwon

Volume

1

fYear

2006

fDate

22-25 Oct. 2006

Firstpage

640

Lastpage

641

Abstract

LiNi_0.5Mn_0.5O₂ thin films were deposited on Pt (200)/ SiO₂/ Si substrates by pulsed laser deposition (PLD) using solid-state sintered LiNi_0.5Mn_0.5O₂ single-phase target. A KrF laser beam (248 nm) with pulse power of 150 mJ and frequency of 10 Hz was focused to LiNi_0.5Mn_0.5O₂ target. The film was deposited for 20 minutes at 450 ~ 600degC and the deposited LiNi_0.5Mn_0.5O₂ thin films showed only (003) and (104) peaks in the XRD pattern. The average thickness of deposited LiNi_0.5Mn_0.5O₂ thin films was 200 nm with a deposit rate of 10 nm/min.

Keywords

lithium; pulsed laser deposition; secondary cells; sintering; substrates; thin films; LiNi_0.5Mn_0.5O₂; LiNi_0.5Mn_0.5O₂ - Interface; PLD; Si; Si - Surface; SiO₂; SiO₂ - Surface; TiO₂; TiO₂ - Surface; lithium-ion battery application; pulse power; pulsed laser deposition; solid-state sintering; thin films; Laser beams; Laser sintering; Optical pulses; Power lasers; Pulsed laser deposition; Semiconductor thin films; Solid lasers; Solid state circuits; Sputtering; Substrates; GADDS; LiNi0.5Mn0.5O2; Lithium-ion battery; PLD; thin film;

fLanguage

English

Publisher

ieee

Conference_Titel

Nanotechnology Materials and Devices Conference, 2006. NMDC 2006. IEEE

Conference_Location

Gyeongju

Print_ISBN

978-1-4244-0541-1

Electronic_ISBN

978-1-4244-0541-1

Type

conf

DOI

10.1109/NMDC.2006.4388942

Filename

4388942