DocumentCode
2238636
Title
Smooth and ultra-precise silicon nanowires fabricated by conventional optical lithography
Author
Palmer, R. ; Alloatti, L. ; Korn, D. ; Moosmann, M. ; Huska, K. ; Lemmer, U. ; Gerthsen, D. ; Schimmel, Th ; Freude, W. ; Koos, C. ; Leuthold, J.
Author_Institution
Karlsruhe Inst. of Technol. (KIT), Karlsruhe, Germany
fYear
2011
fDate
1-6 May 2011
Firstpage
1
Lastpage
2
Abstract
We demonstrate that nanowire waveguides with nanoscale precision and ultra-smooth sidewalls can be fabricated with conventional optical lithography. The presented fabrication scheme exploits the combination of a special staggered lithographic design and preferential wet etching.
Keywords
elemental semiconductors; nanofabrication; nanowires; photolithography; silicon; Si; conventional optical lithography; nanoscale precision; nanowire waveguides; preferential wet etching; staggered lithographic design; ultra-precise silicon nanowires; ultra-smooth sidewalls; Etching; Fabrication; Lithography; Optical waveguides; Photonics; Silicon; Strips;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics (CLEO), 2011 Conference on
Conference_Location
Baltimore, MD
Print_ISBN
978-1-4577-1223-4
Type
conf
Filename
5950558
Link To Document