Layout-Aware Pattern Generation for Maximizing Supply Noise Effects on Critical Paths

As technology scales, gate sensitivity to noise increases due to supply voltage scaling and limited scaling of the voltage threshold. As a result, power supply noise plays a greater role in sub-100 nm technologies and creates signal integrity issues in the chip. It is vital to consider supply voltage noise effects (i) during design validation to apply sufficient guardbands to critical paths and (ii) during path delay test to ensure the performance and reliability of the chip. In this paper, a novel layout-aware pattern generation procedure for maximizing power supply noise effects on critical paths while considering local voltage drop impacts is proposed. The proposed pattern generation and validation flow is implemented on the ITCpsila99 b19 benchmark. Experimental results for both wire-bond and flip-chip packaging styles are presented in this paper. Results demonstrate that our proposed method is fast, significantly increases switching around the functionally testable critical paths, and induces large voltage drop on cells placed in the critical paths which results in increased path delay. The proposed method eliminates the very time consuming pattern validation phase that is practiced in industry.