Implementation of phase shift focus monitor under modified illumination [photolithography]

Author

Nakao, S. ; Miyamoto, Y. ; Maejima, S. ; Ueno, A. ; Yamashita, S. ; Miyazaki, J. ; Tokui, A. ; Tsujita, K. ; Arimoto, I.

Author_Institution

ULSI Dev. Center, Mitsubishi Electr. Corp., Hyogo, Japan

fYear

2001

fDate

Oct. 31 2001-Nov. 2 2001

Firstpage

10

Lastpage

11

Abstract

For the convenience of practical use of phase shift focus monitor (PSFM), imaging characteristics of PSFM are investigated under modified illumination by optical image calculations and printing experiments. Although the mechanism of pattern shift is different from that in conventional high coherent illumination, sufficient sensitivity for precise focus monitoring is predicted by optical image calculation. By experiments, predicted characteristics are observed and similar sensitivity to that in conventional illumination is confirmed.

Keywords

optical focusing; phase shifting masks; ultraviolet lithography; UV lithography; imaging characteristics; optical image calculation; optical image calculations; pattern shift; phase shift focus monitor; photolithography; printing experiments; Apertures; Diffraction; Focusing; Lighting; Monitoring; Optical imaging; Optical sensors; Optical surface waves; Printing; Wavelength measurement;

fLanguage

English

Publisher

ieee

Conference_Titel

Microprocesses and Nanotechnology Conference, 2001 International

Conference_Location

Shimane, Japan

Print_ISBN

4-89114-017-8

Type

conf

DOI

10.1109/IMNC.2001.984033

Filename

984033