• DocumentCode
    2250373
  • Title

    Optimized indium oxide films prepared by DC magnetron sputtering

  • Author

    Axelevitch, A. ; Rabinovitch, E. ; Golan, G.

  • Author_Institution
    Open Univ. Israel, Holon, Israel
  • fYear
    1997
  • fDate
    16-19 March 1997
  • Firstpage
    162
  • Abstract
    Transparent conductive coatings with high electrical conductivity and maximum optical transparency attracts much attention in recent years. Most of the works published till present in this field were concentrated in the physical analysis and design of thin film coatings. In our work we present a different approach to the fabrication design of transparent conductive thin films. Instead of analyzing complex physical models of the final product, a linear mathematical model to control the processing stages of these films is applied. The linear model is based on a mathematical approach which optimizes the processing parameters to yield best coating performance.
  • Keywords
    electrical conductivity; indium compounds; semiconductor growth; semiconductor materials; semiconductor thin films; sputtered coatings; transparency; DC magnetron sputtering; In/sub 2/O/sub 3/; electrical conductivity; fabrication; indium oxide thin film; linear mathematical model; optical transparency; optimization; processing parameters; transparent conductive coating; Coatings; Conductive films; Conductivity; Indium; Magnetic analysis; Mathematical model; Optical device fabrication; Optical films; Process control; Sputtering;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Materials for Advanced Metallization, 1997. MAM '97 Abstracts Booklet., European Workshop
  • Conference_Location
    Villard de Lans, France
  • ISSN
    1266-0167
  • Type

    conf

  • DOI
    10.1109/MAM.1997.621102
  • Filename
    621102