DocumentCode
2250373
Title
Optimized indium oxide films prepared by DC magnetron sputtering
Author
Axelevitch, A. ; Rabinovitch, E. ; Golan, G.
Author_Institution
Open Univ. Israel, Holon, Israel
fYear
1997
fDate
16-19 March 1997
Firstpage
162
Abstract
Transparent conductive coatings with high electrical conductivity and maximum optical transparency attracts much attention in recent years. Most of the works published till present in this field were concentrated in the physical analysis and design of thin film coatings. In our work we present a different approach to the fabrication design of transparent conductive thin films. Instead of analyzing complex physical models of the final product, a linear mathematical model to control the processing stages of these films is applied. The linear model is based on a mathematical approach which optimizes the processing parameters to yield best coating performance.
Keywords
electrical conductivity; indium compounds; semiconductor growth; semiconductor materials; semiconductor thin films; sputtered coatings; transparency; DC magnetron sputtering; In/sub 2/O/sub 3/; electrical conductivity; fabrication; indium oxide thin film; linear mathematical model; optical transparency; optimization; processing parameters; transparent conductive coating; Coatings; Conductive films; Conductivity; Indium; Magnetic analysis; Mathematical model; Optical device fabrication; Optical films; Process control; Sputtering;
fLanguage
English
Publisher
ieee
Conference_Titel
Materials for Advanced Metallization, 1997. MAM '97 Abstracts Booklet., European Workshop
Conference_Location
Villard de Lans, France
ISSN
1266-0167
Type
conf
DOI
10.1109/MAM.1997.621102
Filename
621102
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