DocumentCode
2264652
Title
3D integration technologies for MEMS/IC systems
Author
Ramm, Peter ; Klumpp, Armin ; Weber, Josef
Author_Institution
Munich Div., Fraunhofer Inst. for Reliability & Microintegration, Munich, Germany
fYear
2009
fDate
12-14 Oct. 2009
Firstpage
138
Lastpage
141
Abstract
3D integration is a key solution to the predicted performance problems of future ICs as well as it offers extreme miniaturization and cost-effective fabrication of so-called more than Moore products as e.g. MEMS/IC systems. Through silicon via (TSV) technologies enable high interconnect performance at relatively high fabrication cost compared to 3D packaging. In general it is not only one 3D integration technology suitable for the fabrication of the large variety of 3D integrated systems. Moreover, even one single product may need several different technologies for a cost-effective fabrication. Wireless sensor systems (e.g. e-CUBESreg) an excellent example for the need of a suitable mixture. Consisting of MEMS, ICs, memories, antennas and power modules they can only be fabricated in a cost-efficient way by application of specific optimized 3D technologies for the integration of the different sub-modules. The technology choice for an e-CUBES demonstrator is described.
Keywords
integrated circuit interconnections; microfabrication; 3D integration technologies; 3D packaging; MEMS-IC systems; Moore products; antennas; cost-effective fabrication; e-CUBES demonstrator; power modules; through silicon via technologies; wireless sensor systems; Micromechanical devices; 3D Integration; 3D-IC; ICV-SLID; MEMS; More than Moore; TPMS; TSV technology; Through Silicon Via; e-CUBES; heterogeneous systems;
fLanguage
English
Publisher
ieee
Conference_Titel
Bipolar/BiCMOS Circuits and Technology Meeting, 2009. BCTM 2009. IEEE
Conference_Location
Capri
ISSN
1088-9299
Print_ISBN
978-1-4244-4894-4
Electronic_ISBN
1088-9299
Type
conf
DOI
10.1109/BIPOL.2009.5314117
Filename
5314117
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