Channel waveguides in thin film BaTiO/sub 3/ for a low voltage TE/TM converter

Author

Izuhara, T. ; Osgood, R.M., Jr. ; Roy, A.N. ; Bakhru, H.

Author_Institution

Microelectron. Sci. Lab., Columbia Univ., New York, NY, USA

fYear

2002

fDate

24-24 May 2002

Firstpage

238

Abstract

Summary from only given. To fabricate a planar waveguide, singly charged helium ions are implanted at energy of 700 keV. The sample is tilted 5/spl deg/ to avoid channeling. Channel waveguides have been formed by etching the implanted planar waveguide with diluted HF. Guided modes are observed in CCD. For precision design of the TE/TM mode converter, the mode shape of such a waveguide is simulated by beam propagation method.

Keywords

barium compounds; electro-optical devices; etching; ion implantation; optical fabrication; optical films; optical planar waveguides; optical waveguide theory; photorefractive materials; 700 keV; BaTiO/sub 3/; CCD image sensors; He; TE/TM mode converter; beam propagation method; diluted HF etching; etching; implanted planar waveguide; low voltage TE/TM converter; mode shape; precision design; singly charged helium ion implantation; thin film BaTiO/sub 3/; Low voltage; Optical distortion; Optical fiber couplers; Optical fiber devices; Optical fiber losses; Optical fibers; Optical losses; Optical sensors; Tellurium; Transistors;

fLanguage

English

Publisher

ieee

Conference_Titel

Lasers and Electro-Optics, 2002. CLEO '02. Technical Digest. Summaries of Papers Presented at the

Conference_Location

Long Beach, CA, USA

Print_ISBN

1-55752-706-7

Type

conf

DOI

10.1109/CLEO.2002.1033892

Filename

1033892