DocumentCode
2267547
Title
Examination of high frequency dielectric properties of thin film polymers using an in-situ resonant technique
Author
Laursen, Kirk G. ; Hertling, David ; Hodge, Thomas C. ; Bidstrup, Sue Ann ; Kohl, Paul A.
Author_Institution
Sch. of Electr. & Comput. Eng., Georgia Inst. of Technol., Atlanta, GA, USA
fYear
1995
fDate
31 Jan-2 Feb 1995
Firstpage
229
Lastpage
231
Abstract
Using an on-wafer resonant technique the high frequency dielectric properties of six thin film polymers are measured in the range from 1 GHz to 9 GHz. Comparisons are made between the high frequency and low frequency values of the dielectric constant. The effects of different cure conditions and metallizations are also examined
Keywords
UHF measurement; dielectric resonance; insulating thin films; microwave measurement; multichip modules; permittivity measurement; polymer films; resonance; 1 to 9 GHz; HF dielectric properties; SHF; UHF; cure conditions; dielectric constant; high frequency range; in-situ resonant technique; metallizations; onwafer resonant technique; thin film polymers; Capacitors; Dielectric constant; Dielectric measurements; Dielectric substrates; Dielectric thin films; Dielectrics and electrical insulation; Frequency measurement; Polymer films; Resonance; Resonant frequency;
fLanguage
English
Publisher
ieee
Conference_Titel
Multi-Chip Module Conference, 1995. MCMC-95, Proceedings., 1995 IEEE
Conference_Location
Santa Cruz, CA
Print_ISBN
0-8186-6970-5
Type
conf
DOI
10.1109/MCMC.1995.512032
Filename
512032
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