DocumentCode
2267640
Title
Comparison of transition metal nitride coatings produced using two plasma-based deposition techniques
Author
Firmiss, J. ; Fetherston, P. ; Conrad, J.R.
Author_Institution
Dept. of Nucl. Eng., Wisconsin Univ., Madison, WI, USA
fYear
1995
fDate
5-8 June 1995
Firstpage
115
Abstract
Summary form only given, as follows. Surface coatings of transition metal nitrides have been successfully used in industry to extend the useful life of soft materials while retaining bulk properties. In this study, a comparison of transition metal nitride coatings produced by two plasma-based methods: Physical Vapor Deposition [PVD] and Ion-Beam Enhanced Deposition using Plasma Source Ion Implantation [PSII-IBED] will be performed. Titanium nitride, chromium nitride, and tantalum nitride have been deposited on substrates of aluminum and copper using the above two processes. The tests in this study will focus on the tribological properties of the coatings.
Keywords
ion implantation; laser materials processing; plasma CVD; plasma deposited coatings; transition metal compounds; tribology; vapour deposited coatings; Al; Al substrate; CrN; Cu; Cu substrate; TaN; TiN; bulk properties; ion-beam enhanced deposition; physical vapor deposition; plasma source ion implantation; plasma-based deposition techniques; plasma-based methods; soft materials; surface coatings; transition metal nitride coatings; tribological properties; Atherosclerosis; Chemical vapor deposition; Coatings; Inorganic materials; Metals industry; Plasma applications; Plasma immersion ion implantation; Plasma materials processing; Plasma properties; Plasma sources;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 1995. IEEE Conference Record - Abstracts., 1995 IEEE International Conference on
Conference_Location
Madison, WI, USA
ISSN
0730-9244
Print_ISBN
0-7803-2669-5
Type
conf
DOI
10.1109/PLASMA.1995.531471
Filename
531471
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