Investigation of RF generator response to plasma instabilities

Radio frequency (RF) generators are one of the critical components for RF delivery systems in plasma applications. The main components of a typical RF power delivery system are RF generator, matching network, and plasma power and impedance monitoring device1. The interaction between specifically RF generator and the plasma chamber carries great importance due to dynamic structure of the plasma impedance. Plasma impedance can vary from impedance values with very low voltage standing wave ratios (VSWRs) to impedance values with high VSWRs in a very short period of time for certain processes. If RF plasma generator can not deliver the desired amount of power at the specific steps during plasma processes, then plasma can not sustain. Furthermore, there might be a high amount of reflected RF power back to the generator that can cause operational failure.