• DocumentCode
    22738
  • Title

    Microfabrication of a high-density, non-neutral antimatter trap

  • Author

    Narimannezhad, Alireza ; Jennings, Joshah ; Weber, Marc H. ; Lynn, Kelvin G.

  • Author_Institution
    Center for Mater. Res., Washington State Univ., Pullman, WA, USA
  • Volume
    9
  • Issue
    10
  • fYear
    2014
  • fDate
    10 2014
  • Firstpage
    630
  • Lastpage
    634
  • Abstract
    A unique approach for the fabrication of long-aspect ratio microtubes is presented for an antimatter trap. Conventionally, non-neutral antimatter is stored using a Penning-Malmberg trap, a single tube with aspect ratios being of the order of less than 10:1. Parallel microtubes with aspect ratios of 1000:1 have the potential to store many orders of magnitude more. The silicon industry has paved the way to microelectromechanical systems technologies which have been utilised in this research. Standard processes such as photolithography, deep reactive ion etching, sputtering and thermo-compression bonding were all used; however, unique methods of these processes were developed to overcome many engineering challenges and realise successful trapping.
  • Keywords
    antimatter; microfabrication; micromechanical devices; particle traps; photolithography; sputter etching; Penning-Malmberg trap; deep reactive ion etching; high-density nonneutral antimatter trap; long-aspect ratio microtubes; microelectromechanical system technologies; microfabrication; photolithography; silicon industry; sputtering; thermocompression bonding;
  • fLanguage
    English
  • Journal_Title
    Micro & Nano Letters, IET
  • Publisher
    iet
  • ISSN
    1750-0443
  • Type

    jour

  • DOI
    10.1049/mnl.2014.0239
  • Filename
    6942311