Multiferroic Double-layer BiFeO3-CoFe2O4 Composite Films Prepared by Pulsed-Laser Deposition

Author

Zhu, Yanyan ; Cheng, Jinrong ; Yu, Shengwen ; Wu, Wenbiao ; Meng, Zhongyan

Author_Institution

Shanghai Univ., Shanghai

fYear

2007

fDate

27-31 May 2007

Firstpage

415

Lastpage

417

Abstract

Multiferroic BiFeO₃-CoFe₂O₄ (BFO-CFO) double-layer thin film has been deposited on platinized silicon substrate by pulsed-laser deposition. The BFO and CFO thin layers are deposited at 450 and 600 degC respectively. The diffraction peaks from spinel CoFe₂O₄ phases can be observed from the x-ray diffraction patterns of the double-layer BFO-CFO films. Dielectric constant and loss of the BFO-CFO films are of around 60 and 0.06 respectively, changing little with increasing the frequency. The leakege current density is about 10^-6 A/cm² under the field of 100 kV/cm. BFO-CFO thin films exhibit good ferromagnetic properties with the saturation magnetization of 120 emu/cm³ .

Keywords

X-ray diffraction; bismuth compounds; cobalt compounds; composite materials; dielectric losses; ferroelectric thin films; ferromagnetism; leakage currents; magnetisation; permittivity; pulsed laser deposition; silicon; BiFeO₃-CoFe₂O₄; Si; X-ray diffraction; dielectric constant; dielectric loss; ferromagnetic properties; leakege current density; multiferroic double-layer composite thin film; pulsed-laser deposition; saturation magnetization; temperature 450 C; temperature 600 C; Current density; Dielectric constant; Dielectric losses; Dielectric substrates; Dielectric thin films; Frequency; Semiconductor thin films; Silicon; Sputtering; X-ray diffraction;

fLanguage

English

Publisher

ieee

Conference_Titel

Applications of Ferroelectrics, 2007. ISAF 2007. Sixteenth IEEE International Symposium on

Conference_Location

Nara

ISSN

1099-4734

Print_ISBN

978-1-4244-1334-8

Electronic_ISBN

1099-4734

Type

conf

DOI

10.1109/ISAF.2007.4393283

Filename

4393283