DocumentCode
2277445
Title
Large aperture, high-efficiency multilayer dielectric reflection gratings
Author
Britten, J.A. ; Bryan, S.J. ; Summers, L.J. ; Nguyen, H.T. ; Shore, B.W. ; Lyngnes, O.
Author_Institution
Lawrence Livermore Nat. Lab., CA, USA
fYear
2002
fDate
24-24 May 2002
Abstract
We have designed and fabricated a 355 /spl times/ 150 mm multilayer dielectric diffraction grating, 1800 l/mm for 1030 nm light, that exhibits > 99% diffraction efficiency and a diffracted wavefront flatness of < 0.15 /spl lambda/. This grating is an enabling component of a 2 ps, high rep-rate machining laser currently in operation at LLNL.
Keywords
diffraction gratings; electron beam deposition; laser beam machining; optical design techniques; optical fabrication; optical multilayers; optical pulse compression; 1030 nm; 150 mm; 2 ps; 355 mm; 99 percent; LLNL; Lawrence Livermore National Laboratory; diffracted wavefront flatness; diffraction efficiency; high rep-rate machining laser; large aperture high-efficiency multilayer dielectric reflection gratings; pulse compressor; Apertures; Dielectrics; Diffraction gratings; Etching; Nonhomogeneous media; Optical design; Optical diffraction; Optical pulses; Optical reflection; Pulse compression methods;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 2002. CLEO '02. Technical Digest. Summaries of Papers Presented at the
Conference_Location
Long Beach, CA, USA
Print_ISBN
1-55752-706-7
Type
conf
DOI
10.1109/CLEO.2002.1034483
Filename
1034483
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