• DocumentCode
    2282240
  • Title

    3D Trigate 1T-DRAM Memory Cell for 2x nm Nodes

  • Author

    Gamiz, Francisco ; Rodriguez, N. ; Cristoloveanu, S.

  • Author_Institution
    Dept. of Electron., Univ. of Granada, Granada, Spain
  • fYear
    2012
  • fDate
    20-23 May 2012
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    This paper presents a capacitor-less 1T DRAM cell based on a 3D Triple-gate multibody transistor with high scalability, low-power consumption, long retention time, non-destructive reading, and wide memory window. High performance is demonstrated on a 20nm channel length device, including ´1´ to ´0´ current ratio larger than 103 (with negligible ´0´ current level), very low voltage bias operation and retention time longer than 20ms at 85°C in worst cases. Compared to the previous equivalent 3D memory cells reported so far, the proposed cell shows longer retention time even though the gate length shrinks to the half of them. The voltages used to write and read the information is by far, much smaller than the previously reported ones in comparable structures. We have confirmed by TCAD simulation that the improvements are attributed to an innovative operation concept: a dedicated body partitioning.
  • Keywords
    DRAM chips; 3D trigate 1T-DRAM memory cell; 3D triple-gate multibody transistor; TCAD simulation; capacitor-less 1T DRAM cell; channel length device; dedicated body partitioning; low-power consumption; nondestructive reading; size 20 nm; temperature 85 degC; wide memory window; Charge carrier processes; Doping; Logic gates; Random access memory; Three dimensional displays; Transistors; Writing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Memory Workshop (IMW), 2012 4th IEEE International
  • Conference_Location
    Milan
  • Print_ISBN
    978-1-4673-1079-6
  • Type

    conf

  • DOI
    10.1109/IMW.2012.6213629
  • Filename
    6213629