DocumentCode
2282328
Title
An Update on Emerging Memory: Progress to 2Xnm
Author
Prall, Kirk ; Ramaswamy, Nirmal ; Kinney, Wayne ; Holtzclaw, Karl ; Chen, Xiaonan ; Strand, Jonathan ; Bez, Roberto
Author_Institution
Micron Technol., Boise, ID, USA
fYear
2012
fDate
20-23 May 2012
Firstpage
1
Lastpage
5
Abstract
This paper will give an update on the status of emerging memory (EM) and potential markets. The more popular EM technologies will be reviewed, including PCM, RRAM, and STRAM. The biggest challenges for each technology will be highlighted.
Keywords
random-access storage; EM technology; PCM; RRAM; STRAM; emerging memory; potential markets; Anisotropic magnetoresistance; Heating; Noise; Phase change materials; Random access memory; Resistance;
fLanguage
English
Publisher
ieee
Conference_Titel
Memory Workshop (IMW), 2012 4th IEEE International
Conference_Location
Milan
Print_ISBN
978-1-4673-1079-6
Type
conf
DOI
10.1109/IMW.2012.6213635
Filename
6213635
Link To Document