DocumentCode
2282837
Title
AlOx-Based Resistive Switching Device with Gradual Resistance Modulation for Neuromorphic Device Application
Author
Yi Wu ; Shimeng Yu ; Wong, H.-S Philip ; Yu-Sheng Chen ; Heng-Yuan Lee ; Sum-Min Wang ; Pei-Yi Gu ; Chen, Fan ; Ming-Jinn Tsai
Author_Institution
Dept. of Electr. Eng., Stanford Univ., Stanford, CA, USA
fYear
2012
fDate
20-23 May 2012
Firstpage
1
Lastpage
4
Abstract
AlOx-based resistive switching device (RRAM) with multi-level storage capability was investigated for the potential to serve as an electronic synapse device. The Ti/AlOx/TiN memory stack with memory size 0.48um×0.48um was fabricated; the resistive layer AlOx was deposited using atomic-layer- deposition (ALD) method. Multi-level resistance states were obtained by varying the compliance current levels or the applied voltage amplitudes during pulse cycling. These resistance states are thermally stable for over 1E5s at 125°C. The memory cell resistance can be continuously increased or decreased from each pulse cycle to pulse cycle. More than 1E5 endurance cycles and reading cycles were demonstrated. We further study the potential using this AlOx-based RRAM as electronic synapse device. Around 1% resistance change per pulse cycling was achieved and a plasticity learning rule pulse scheme was proposed to implement the memory device in large-scale hardware neuromorphic computing system.
Keywords
alumina; atomic layer deposition; random-access storage; titanium compounds; AlOx; RRAM; Ti-AlOx-TiN; atomic-layer-deposition; compliance current level; electronic synapse device; gradual resistance modulation; large-scale hardware neuromorphic computing system; memory cell resistance; memory stack; multilevel resistance state; multilevel storage; neuromorphic device; plasticity learning rule pulse scheme; pulse cycling; resistive layer; resistive switching device; temperature 125 C; voltage amplitude; Immune system; Neuromorphics; Resistance; Switches; Timing; Tin;
fLanguage
English
Publisher
ieee
Conference_Titel
Memory Workshop (IMW), 2012 4th IEEE International
Conference_Location
Milan
Print_ISBN
978-1-4673-1079-6
Type
conf
DOI
10.1109/IMW.2012.6213663
Filename
6213663
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