• DocumentCode
    2282837
  • Title

    AlOx-Based Resistive Switching Device with Gradual Resistance Modulation for Neuromorphic Device Application

  • Author

    Yi Wu ; Shimeng Yu ; Wong, H.-S Philip ; Yu-Sheng Chen ; Heng-Yuan Lee ; Sum-Min Wang ; Pei-Yi Gu ; Chen, Fan ; Ming-Jinn Tsai

  • Author_Institution
    Dept. of Electr. Eng., Stanford Univ., Stanford, CA, USA
  • fYear
    2012
  • fDate
    20-23 May 2012
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    AlOx-based resistive switching device (RRAM) with multi-level storage capability was investigated for the potential to serve as an electronic synapse device. The Ti/AlOx/TiN memory stack with memory size 0.48um×0.48um was fabricated; the resistive layer AlOx was deposited using atomic-layer- deposition (ALD) method. Multi-level resistance states were obtained by varying the compliance current levels or the applied voltage amplitudes during pulse cycling. These resistance states are thermally stable for over 1E5s at 125°C. The memory cell resistance can be continuously increased or decreased from each pulse cycle to pulse cycle. More than 1E5 endurance cycles and reading cycles were demonstrated. We further study the potential using this AlOx-based RRAM as electronic synapse device. Around 1% resistance change per pulse cycling was achieved and a plasticity learning rule pulse scheme was proposed to implement the memory device in large-scale hardware neuromorphic computing system.
  • Keywords
    alumina; atomic layer deposition; random-access storage; titanium compounds; AlOx; RRAM; Ti-AlOx-TiN; atomic-layer-deposition; compliance current level; electronic synapse device; gradual resistance modulation; large-scale hardware neuromorphic computing system; memory cell resistance; memory stack; multilevel resistance state; multilevel storage; neuromorphic device; plasticity learning rule pulse scheme; pulse cycling; resistive layer; resistive switching device; temperature 125 C; voltage amplitude; Immune system; Neuromorphics; Resistance; Switches; Timing; Tin;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Memory Workshop (IMW), 2012 4th IEEE International
  • Conference_Location
    Milan
  • Print_ISBN
    978-1-4673-1079-6
  • Type

    conf

  • DOI
    10.1109/IMW.2012.6213663
  • Filename
    6213663