• DocumentCode
    2302640
  • Title

    Electron Emission near a Triple Point

  • Author

    Jordan, N.M. ; French, D.M. ; Lau, Y.Y. ; Gilgenbach, R.M. ; Pengvanich, P.

  • Author_Institution
    Nucl. Eng. & Radiol. Sci., Univ. of Michigan, Ann Arbor, MI
  • fYear
    2008
  • fDate
    27-31 May 2008
  • Firstpage
    311
  • Lastpage
    311
  • Abstract
    Triple point, defined as the junction of metal, dielectric, and vacuum, is the location where electron emission is favored in the presence of a sufficiently strong electric field. In addition to being an electron source, the triple point is generally regarded as the location where flashover is initiated in high voltage insulation, and as the vulnerable spot from which rf breakdown is triggered. In this paper, we focus on the electric field distribution at a triple point of a general geometry, as well as the electron orbits in its immediate vicinity. We calculate the orbit of the first generation electrons, the seed electrons. We found that, despite the mathematically divergent electric field at the triple point, significant electron yield most likely results from secondary electron emission when the seed electrons strike the dielectric. The analysis gives the voltage scale in which this electron multiplication may occur. It also provides an explanation on why certain dielectric angles are more favorable to electron generation over others, as observed in previous experiments.
  • Keywords
    electric breakdown; electric fields; electron emission; electric field distribution; electron emission; high voltage insulation; rf breakdown; triple point; Breakdown voltage; Cathodes; Dielectric substrates; Dielectrics and electrical insulation; Electron emission; Electron sources; Flashover; Geometry; Orbital calculations; Orbits;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    IEEE International Power Modulators and High Voltage Conference, Proceedings of the 2008
  • Conference_Location
    Las Vegas, NE
  • Print_ISBN
    978-1-4244-1534-2
  • Electronic_ISBN
    978-1-4244-1535-9
  • Type

    conf

  • DOI
    10.1109/IPMC.2008.4743644
  • Filename
    4743644