• DocumentCode
    2303398
  • Title

    Extreme ultraviolet lasers demonstrate new nano-patterning schemes

  • Author

    Marconi, M.C. ; Wachulak, P. ; Urbanski, L. ; Menoni, C.S. ; Rocca, J.J. ; Isoyan, A. ; Jiang, F. ; Cheng, Y. ; Cerrina, F.

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Colorado State Univ., Fort Collins, CO, USA
  • fYear
    2010
  • fDate
    7-11 Nov. 2010
  • Firstpage
    335
  • Lastpage
    336
  • Abstract
    Table-top extreme ultraviolet lasers at λ=46.9 allow compact photo-lithography systems utilizing coherent imaging techniques. Interferometric lithography, holographic lithography and Talbot lithography were demonstrated with sub-100 nm resolution in compact setups.
  • Keywords
    computer-generated holography; lasers; light interferometry; nanopatterning; photolithography; Talbot lithography; coherent imaging techniques; compact photolithography systems; extreme ultraviolet lasers; holographic lithography; interferometric lithography; nanopatterning; wavelength 46.9 nm;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    IEEE Photonics Society, 2010 23rd Annual Meeting of the
  • Conference_Location
    Denver, CO
  • ISSN
    -
  • Print_ISBN
    978-1-4244-5368-9
  • Electronic_ISBN
    -
  • Type

    conf

  • DOI
    10.1109/PHOTONICS.2010.5698896
  • Filename
    5698896
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2303398