• DocumentCode
    2306240
  • Title

    Visible filter integrated with an image sensor fabricated by a 90-nm standard CMOS process

  • Author

    Yoon, Yeo-Taek ; Lee, Sang-Shin ; Lee, Byoung-Su

  • Author_Institution
    Dept. of Electron. Eng., Kwangwoon Univ., Seoul, South Korea
  • fYear
    2010
  • fDate
    7-11 Nov. 2010
  • Firstpage
    630
  • Lastpage
    631
  • Abstract
    A visible filter, enabling a homogeneous integration with an image sensor, was demonstrated through an advanced standard 90-nm CMOS process. The overall transmission was as high as about 85% in the visible band.
  • Keywords
    CMOS image sensors; CMOS process; homogeneous integration; image sensor; size 90 nm; visible filter;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    IEEE Photonics Society, 2010 23rd Annual Meeting of the
  • Conference_Location
    Denver, CO
  • ISSN
    -
  • Print_ISBN
    978-1-4244-5368-9
  • Electronic_ISBN
    -
  • Type

    conf

  • DOI
    10.1109/PHOTONICS.2010.5699045
  • Filename
    5699045
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2306240