• DocumentCode
    2308514
  • Title

    Electron Energy Distributions In Electron Cyclotron Resonance Plasmas for Materials Processing

  • Author

    Yilin Weng ; Kushner, M.J.

  • Author_Institution
    University of Illinois
  • fYear
    1991
  • fDate
    3-5 June 1991
  • Firstpage
    137
  • Lastpage
    137
  • Keywords
    Cyclotrons; Electrons; Plasma density; Plasma devices; Plasma materials processing; Plasma properties; Plasma sheaths; Plasma sources; Plasma temperature; Resonance;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1991. IEEE Conference Record - Abstracts., 1991 IEEE International Conference on
  • Conference_Location
    Williamsburg, VA, USA
  • Print_ISBN
    0-7803-0147-1
  • Type

    conf

  • DOI
    10.1109/PLASMA.1991.695586
  • Filename
    695586