• DocumentCode
    2313421
  • Title

    A room-temperature single-electron memory device using fine-grain polycrystalline silicon

  • Author

    Yano, K. ; Ishii, T. ; Hashimoto, T. ; Kobayashi, T. ; Murai, F. ; Seki, K.

  • Author_Institution
    Central Res. Lab., Hitachi Ltd., Tokyo, Japan
  • fYear
    1993
  • fDate
    5-8 Dec. 1993
  • Firstpage
    541
  • Lastpage
    544
  • Abstract
    The first room-temperature operation is demonstrated of a single-electron memory device, in which an electron represents one-bit information. This is made possible due to our new one-transistor memory configuration (conventionally three circuit elements are needed), which has very high charge sensitivity. Another new technique, which stabilizes the one-electron stored state, is ultra-thin (4 nm) poly-Si film for the active region, in which an array of 10-nm grains are naturally formed. In the fabricated poly-Si TFTs a single electron is systematically stored (or "written") with every 15-V gate-voltage increase, and the number of stored electrons is counted (or "read") by the quantized threshold-voltage shift. The single-electron memory provides a new non-volatile RAM, which is very suitable for mobile computers/communicators.<>
  • Keywords
    elemental semiconductors; quantum interference devices; random-access storage; semiconductor storage; silicon; thin film transistors; Si; charge sensitivity; fine-grain polycrystalline silicon; mobile communicators; mobile computers; nonvolatile RAM; one-electron stored state; one-transistor memory; poly-Si TFTs; quantized threshold-voltage shift; room-temperature operation; single-electron memory device; ultra-thin film; Buffer storage; Circuits; Nonvolatile memory; Random access memory; Silicon; Single electron devices; Single electron memory; Temperature; Threshold voltage; Ultra large scale integration;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1993. IEDM '93. Technical Digest., International
  • Conference_Location
    Washington, DC, USA
  • ISSN
    0163-1918
  • Print_ISBN
    0-7803-1450-6
  • Type

    conf

  • DOI
    10.1109/IEDM.1993.347292
  • Filename
    347292