• DocumentCode
    2314631
  • Title

    Long wavelength In/sub 0.53/Ga/sub 0.47/As photodetectors on GaAs with a thin super lattice buffer

  • Author

    Pao, Y.C. ; Yuen, C. ; Madden, C. ; Marsland, R.

  • Author_Institution
    Litton Solid State Div., Santa Clara, CA, USA
  • fYear
    1993
  • fDate
    5-8 Dec. 1993
  • Firstpage
    217
  • Lastpage
    220
  • Abstract
    In/sub 0.53/Ga/sub 0.47/As-based, high speed long wavelength photodetectors have been demonstrated on GaAs substrates with a thin In/sub 0.52/Al/sub 0.48/As/AlAs super lattice buffer of 500 /spl Aring/. The photodetector epitaxial material was grown selectively by solid-source Molecular Beam Epitaxy and fabricated by conventional GaAs MMIC processing. Photoresponsivity of over 0.3 A/W has been achieved for strain relaxed In/sub 0.53/Ga/sub 0.47/As photodetectors fabricated on GaAs substrates, with frequency responses measured up to 50 GHz. The successful demonstration of long wavelength photodetectors with strain-relaxed In/sub 0.53/Ga/sub 0.47/As on GaAs substrates, allows long wavelength optoelectronics or OEICs to take full advantages of the well established GaAs MMIC technology.<>
  • Keywords
    III-V semiconductors; gallium arsenide; indium compounds; integrated optoelectronics; molecular beam epitaxial growth; photodetectors; semiconductor epitaxial layers; semiconductor growth; semiconductor superlattices; 50 GHz; GaAs; GaAs substrates; In/sub 0.53/Ga/sub 0.47/As; In/sub 0.53/Ga/sub 0.47/As-In/sub 0.52/Al/sub 0.48/As-AlAs-GaAs; OEICs; epitaxial material; frequency responses; long wavelength optoelectronics; long wavelength photodetectors; photoresponsivity; solid-source molecular beam epitaxy; super lattice buffer; Capacitive sensors; Fabrication; Gallium arsenide; Lattices; Lithography; MMICs; Molecular beam epitaxial growth; Photodetectors; Schottky barriers; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1993. IEDM '93. Technical Digest., International
  • Conference_Location
    Washington, DC, USA
  • ISSN
    0163-1918
  • Print_ISBN
    0-7803-1450-6
  • Type

    conf

  • DOI
    10.1109/IEDM.1993.347366
  • Filename
    347366