DocumentCode
2318664
Title
Endurance of Si field emitters prepared by VLS technique
Author
Mescheryakova, A.L. ; Zhirnov, V.V.
Author_Institution
Inst. of Crystallogr., Moscow, Russia
fYear
1998
fDate
19-24 July 1998
Firstpage
103
Lastpage
104
Abstract
Field emitters, prepared from Si whiskers grown by Vapor-Liquid-Solid (VLS) technique show superior emission performance as compared with other Si-based emitters, due to their shape and high aspect ratio. In this paper the results about the endurance of Si VLS-emitters are first presented. Two types of samples were studied: (1) "tip-on-post" samples for applications as point electron sources and (2) large-area (up to 6 cm) wafer-grown Si FEA. The two types of the samples differ in VLS growth conditions, and as it was found, they have different endurance. The endurance problem can be subdivided in two parts: stability of emitting surface (apex) and endurance (life time) of emitters body during operation and long-term storage.
Keywords
electron field emission; elemental semiconductors; silicon; vacuum microelectronics; whiskers (crystal); FEA; Si; Si whisker; endurance; field emitter; point electron source; stability; vapor-liquid-solid growth; Coatings; Crystallography; Degradation; Electron sources; Gold; Rough surfaces; Shape; Statistics; Surface morphology; Surface roughness;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Microelectronics Conference, 1998. Eleventh International
Conference_Location
Asheville, NC, USA
Print_ISBN
0-7803-5096-0
Type
conf
DOI
10.1109/IVMC.1998.728662
Filename
728662
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