• DocumentCode
    2318664
  • Title

    Endurance of Si field emitters prepared by VLS technique

  • Author

    Mescheryakova, A.L. ; Zhirnov, V.V.

  • Author_Institution
    Inst. of Crystallogr., Moscow, Russia
  • fYear
    1998
  • fDate
    19-24 July 1998
  • Firstpage
    103
  • Lastpage
    104
  • Abstract
    Field emitters, prepared from Si whiskers grown by Vapor-Liquid-Solid (VLS) technique show superior emission performance as compared with other Si-based emitters, due to their shape and high aspect ratio. In this paper the results about the endurance of Si VLS-emitters are first presented. Two types of samples were studied: (1) "tip-on-post" samples for applications as point electron sources and (2) large-area (up to 6 cm) wafer-grown Si FEA. The two types of the samples differ in VLS growth conditions, and as it was found, they have different endurance. The endurance problem can be subdivided in two parts: stability of emitting surface (apex) and endurance (life time) of emitters body during operation and long-term storage.
  • Keywords
    electron field emission; elemental semiconductors; silicon; vacuum microelectronics; whiskers (crystal); FEA; Si; Si whisker; endurance; field emitter; point electron source; stability; vapor-liquid-solid growth; Coatings; Crystallography; Degradation; Electron sources; Gold; Rough surfaces; Shape; Statistics; Surface morphology; Surface roughness;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Microelectronics Conference, 1998. Eleventh International
  • Conference_Location
    Asheville, NC, USA
  • Print_ISBN
    0-7803-5096-0
  • Type

    conf

  • DOI
    10.1109/IVMC.1998.728662
  • Filename
    728662