DocumentCode
2321732
Title
VO2 thin films for micromanipulators
Author
Ramsey, C. ; Cabrera, Rafmag ; Merced, Emmanuelle ; Sepulveda, Nelson
Author_Institution
Dept. of Electr. & Comput. Eng., Michigan State Univ., East Lansing, MI, USA
fYear
2012
fDate
16-19 Oct. 2012
Firstpage
120
Lastpage
123
Abstract
The use of VO2 thin films as the active element in micromanipulators of multiple degrees of freedom is studied. It is shown that the insulator-to-metal transition of VO2, which occurs at around 68°C, can be used to create localized stress gradients in micro-structures. By controlling the location and intensity of these stress gradients, precise and multiple inflection points within a cantilever beamcan be achieved. This transition can be induced locally by any form of heating. In this work the transition is induced by optical radiation which allows remote actuation of the micromanipulators. Due to the relatively low transition temperature of VO2, the particularly localized heating shown here, and the recently demonstrated actuation in aqueous media, these micromanipulators can be used in the different fields of bio-engineering.
Keywords
cantilevers; electric heating; metal-insulator boundaries; micromanipulators; thin film devices; vanadium compounds; VO2; bioengineering; cantilever beam; inflection point; insulator-to-metal transition; intensity control; localized stress gradient; location control; micromanipulator; microstructure; multiple degrees of freedom; optical radiation; remote actuation; thin film;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanotechnology Materials and Devices Conference (NMDC), 2012 IEEE
Conference_Location
Waikiki Beach, HI
Print_ISBN
978-1-4673-2871-5
Type
conf
DOI
10.1109/NMDC.2012.6527573
Filename
6527573
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