• DocumentCode
    2321732
  • Title

    VO2 thin films for micromanipulators

  • Author

    Ramsey, C. ; Cabrera, Rafmag ; Merced, Emmanuelle ; Sepulveda, Nelson

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Michigan State Univ., East Lansing, MI, USA
  • fYear
    2012
  • fDate
    16-19 Oct. 2012
  • Firstpage
    120
  • Lastpage
    123
  • Abstract
    The use of VO2 thin films as the active element in micromanipulators of multiple degrees of freedom is studied. It is shown that the insulator-to-metal transition of VO2, which occurs at around 68°C, can be used to create localized stress gradients in micro-structures. By controlling the location and intensity of these stress gradients, precise and multiple inflection points within a cantilever beamcan be achieved. This transition can be induced locally by any form of heating. In this work the transition is induced by optical radiation which allows remote actuation of the micromanipulators. Due to the relatively low transition temperature of VO2, the particularly localized heating shown here, and the recently demonstrated actuation in aqueous media, these micromanipulators can be used in the different fields of bio-engineering.
  • Keywords
    cantilevers; electric heating; metal-insulator boundaries; micromanipulators; thin film devices; vanadium compounds; VO2; bioengineering; cantilever beam; inflection point; insulator-to-metal transition; intensity control; localized stress gradient; location control; micromanipulator; microstructure; multiple degrees of freedom; optical radiation; remote actuation; thin film;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanotechnology Materials and Devices Conference (NMDC), 2012 IEEE
  • Conference_Location
    Waikiki Beach, HI
  • Print_ISBN
    978-1-4673-2871-5
  • Type

    conf

  • DOI
    10.1109/NMDC.2012.6527573
  • Filename
    6527573