• DocumentCode
    2326880
  • Title

    Modeling of temperature effect on threshold voltage of ballistic Ge tunneling FET

  • Author

    Siddiqui, Saima Afroz ; Zubair, Ahmad ; Shoron, Omor Faruk ; Khosru, Quazi D M

  • Author_Institution
    Dept. of Electr. & Electron. Eng., Bangladesh Univ. of Eng. & Technol., Dhaka, Bangladesh
  • fYear
    2010
  • fDate
    18-20 Dec. 2010
  • Firstpage
    235
  • Lastpage
    238
  • Abstract
    The effect of temperature and scaling of gate length on the threshold voltage of double gate Ge tunneling FET has been studied. The threshold voltage has been determined from transconductance rather than constant current method. In the 10 nm to 50 nm range scaling has almost no effect on threshold voltage. However, threshold voltage is function of temperature in the range of 250-500 K. Besides, a simple model for threshold voltage incorporating the temperature effect has been developed for ballistic Ge tunneling FET based on the simulated results.
  • Keywords
    elemental semiconductors; field effect transistors; germanium; semiconductor device models; Ge; ballistic tunneling FET; constant current method; gate length scaling; size 10 nm to 50 nm; temperature 250 K to 500 K; temperature effect modelling; threshold voltage; Tunnel FET; band to band tunneling; gate threshold voltage; scaling; temperature; transconductance;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electrical and Computer Engineering (ICECE), 2010 International Conference on
  • Conference_Location
    Dhaka
  • Print_ISBN
    978-1-4244-6277-3
  • Type

    conf

  • DOI
    10.1109/ICELCE.2010.5700671
  • Filename
    5700671