• DocumentCode
    2333411
  • Title

    Mobility diminution in a nano-MOSFET due to carrier injection from the ohmic contacts

  • Author

    Riyadi, Munawar ; Tan, Michael L P ; Hashim, Abdul Manaf ; Arora, Vijay K.

  • Author_Institution
    Fac. of Electr. Eng., Univ. Teknol. Malaysia, Skudai, Malaysia
  • fYear
    2010
  • fDate
    1-3 Dec. 2010
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    Summary form only given. Ballistic transport is collision-free carriers drift in a conducting channel whose ballistic length LB is smaller than the scattering-limited mean free path ℓB. In such channels, the probability of scattering is still finite. The probability that a carrier after being injected from the Ohmic contacts will undergo collision in traversing a ballistic length LB is exp(-LB / ℓB). The probability that it will go ballistic (collision-free) is (1-exp (-LB I ℓB). This modifies the traditional long-channel mobility μ to a size-limited mobility μL given by μL= μ[1-exp(-LB/ℓB)] (1). The ballistic mean free path IB differs from the channel mean free path ℓ as contacts play a. predominant role in the ballistic transport. The carriers are injected from the metallic contacts at a Fermi velocity vF for which the probability of tunnelling through the metal-semiconductor contact is the highest. This Fermi velocity is 2.0 × 106 m/s for the Fermi energy of 11.6 eV for an Al contact. With this injection velocity vinj the ballistic mean free path is given by ℓB = ℓinj / vm) (2) where vm is the mobility velocity appropriate to 2-D electron gas. ℓB >; ℓ was identified in the experiments of Luskawoski et. al. A pocket mean free path ℓp was added to ℓ to get a ballistic mean free path ℓB = ℓ + ℓP that is not consistent with the scattering theory for two reasons. Firstly, mean free paths from two distinct regions canno- - t be combined. Secondly, the inverse mean free paths are normally combined as ℓB-1 = ℓ-1 + ℓp-1. The ballistic length LB through which the an injected carrier travels is sum of the channel region and contact region (LB = L + Lcon) . The metal contact can be separated by more than 10 nm from the channel region (Lcon ≈ 10nm). Since the information about the contacts is not available in the published papers, Lcon is neglected making LB ≈ L . Fig. 1 shows the comparison of Eq. (1) to the experimental data discussed in. In The ballistic mean free path to fit the ballistic mobility data was found to be much larger than extracted from long-channel mobility, consistent with Eq. (2). When corrected for the intrinsic velocity vinj for arbitrary degeneracy in the channel and injection velocity v from the contacts, the application of Matthiessen-like rule modifies the expression for μL given by Shur that is given by μL =1(1 + (ℓB/L)) (3) The mobility degradation towards falling channel length is steeper as predicted from Eq. (1) than that predicted from Eq. (3) showing the importance of the injection velocity from the contacts in ballistic transport.
  • Keywords
    Fermi level; MOSFET; ballistic transport; ohmic contacts; semiconductor-metal boundaries; tunnelling; Fermi energy; Fermi velocity; Matthiessen like rule; ballistic length; ballistic transport; carrier injection; long channel mobility; metal-semiconductor contact; mobility diminution; nanoMOSFET; ohmic contact; scattering limited mean free path; tunnelling probability;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Enabling Science and Nanotechnology (ESciNano), 2010 International Conference on
  • Conference_Location
    Kuala Lumpur
  • Print_ISBN
    978-1-4244-8853-7
  • Type

    conf

  • DOI
    10.1109/ESCINANO.2010.5701035
  • Filename
    5701035